Reaction Mechanisms and Dynamics in the Early Stage of High-κ Oxide Atomic Layer Deposition : Investigations by In Situ and Operando X-ray Photoemission Spectroscopy
Atomic layer deposition (ALD) is an outstanding deposition technique to deposit highly conformal and uniform thin films with atomic precision. In particular, ALD of transition metal oxide layers from metal amido complexes and water finds its way in several technological fields, including green energy devices and in the semiconductor industry. These ALD reactions are believed to follow a reaction s